The company is able to offer the following deposition and etching sources for vacuum applications
Sputtering source: we are able to offer linear rectangular and circular sources to for sputtering. We are able to offer up to 1 meter linear magnetron sputtering source that suitable to deposit various materials.
Ion beam source: we are able to design and fabricate the grid less ion beam source that able to use as cleaning and reactive purpose. Rectangular source up to 1 m can be made.
We are able to customize the sources to various deposition chambers. The sources can be mounted internally or externally.
Magnetron Sputtering Source
Magnetron Sputtering Source
Widely used in varios metalization.
High purity of the thin film.
Size(up to 1 meter liner) and shape(rectangular or circular) customised
Supported by high voltage/high frequency pulsed DC generator.
Ion Beam Source
Ion-Beam Source
Widely used in substrate cleaning before coating.
The size and shape can be designed according to customer's requirement.
FCVA
