<%@ Page Language="C#" ContentType="text/html" ResponseEncoding="gb2312" %> Equipment Business - HDD Slider and Media
 
Procudts / FCVA ta-C film Source
 





HDD Slider and Media
Nanofilm’s patented FCVA sources has been installed and commissioned since 1999 in all major slider makers for slider carbon overcoat application. The technological break through that produces the thinnest, hardest and highest density ta-C film helps to improve the density of the HDD tremendously. The current technology are able to produce 1.5nm (less than 10 atomic layers) ta-C film that able to protect the slider from damage.

The FCVA technology has been evaluated in some major HDD makers for media applications since a couple years ago. The film was proven to be the very promising candidates for the next generation media overcoat to protect the precious data as well as to further reduce the overcoat thickness. Reduction of the overcoat thickness resulting the increase of capability of the reading and writing of the data in smaller area and thus increase the storage capability without any significant modification of the hardware.
FCVA Thin Film:




                        Slider Source
 



We have wide range of FCVA sources for various applications, the FCVA sources that cater for the slider and media are Slider: FS1 Media: FS2 and FS2T


FS1 offers high precision control of uniformity and repeatability of the ta-C films that able to meet today most demanding requirement of slider overcoat requirement, the accuracy is in the atomic layer. The source is designed to be fully automated and can be configured to fix to most of the platforms.

FS2 series are designed for high throughput and long maintenance interval to ensure the productivity of the media production which the output can be as high as 1000 disc/hour. The FS2T offers non-interrupted continuous production with 2 targets configuration to meet the most strengthen production requirements.

Coating System:

 
   
Home Contact Quality&Environment Company Patents
Copyright ©1999-2010 Nanofilm Technologies International Pte. Ltd. All rights reserved