<%@ Page Language="C#" ContentType="text/html" ResponseEncoding="gb2312" %> Technology - FCVA Thin Film (Metal)
 
FCVA Technology
 

 

Nanofilm specializes on various vacuum metalization technologies that able to provide functional and decorative coating for various applications. The metals are Cu, Al, Cr, Ti and others.

 

Our FCVA technology has the capability of producing large area of ultra pure metal coating with an excellent uniformity at room temperature. Metal film made by FCVA has consistent low resistivity close to that of a bulk material when the film thickness is above 120nm. Metal coating species by FCVA is 100% ions. It has a narrow yet adjustable energy distribution. It totally eliminates overhang problem for high A/R (Aspect Ratio) trenches. It also has excellent bottom-up filling property which can not be realized by other deposition methods.

 
 
 

 

Copper Film Deposited with an Industrial DC Arc:
• The film surface is very rough

 

 

Clean Copper Film by FCVA Technique:
• The film surface is smooth

 
 

Benefits of using FCVA metal thin film :


  • FCVA technique can deposit thinner, more uniform
    layers of metals in a variety of architectures.

  • It can be used in narrower trenches with higher
    depth-to-width aspect ratios.

  • It can fill trenches from bottom up, thus eliminating
    uneven deposition which can lead to voids in the metal
    lines.

  • Cu Resistivity Obtained Close to Bulk Material

 
 
 
 
 
   
Application:

  • Platic decorative

  • Cavity mold

  • Micromachining part

  • Microelectronics

 
 
Coating System:
 
 
 
Coating Service:
 
 
 
   
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