Metal nitride film is wildly used in mold, tool, cavity bar,form and punch coatings for its special hardness and other physical properties.

Our FCVA metal nitride film(TiN, CrN) has higher quality compared to other techniques. The off-plane double bend technology can overcome the problems of macroparticles associated with other cathodic arc methods. In the chamber the highly energetic ions are capable of ionizing the nitrogen gas resulting in better reaction between the metal ions and the nitrogen. By applying a bias on the substrate, the kinetic energy of the ions incident on the substrate can be varied electronstatically.

Thanks to the FCVA technology, we are capable of producing metal nitride film with excellent uniformity, considerable hardness and wear resistance at a higher deposition rate and lower temperature.

Our FCVA deposition runs under the low temperature(<80º), so the substrate is no longer restricted to those anti-heat materials.