Aluminum oxide film is wildly used in Microelectronics, Tool coatings and Optics for its special electrical, optical and other physical properties.

Our FCVA Al₂O₃ film has higher quality compared to other techniques. The off-plane double bend technology can overcome the problems of macroparticles associated with other cathodic arc methods. In the chamber the highly energetic ions are capable of ionizing the oxygen gas resulting in better reaction between the aluminum ions and the oxygen. By applying a bias on the substrate, the kinetic energy of the ions incident on the substrate can be varied electronstatically.

Thanks to the FCVA technology, we are capable of producing Al₂O₃ film with excellent uniformity, prominent optical properties, considerable hardness and wear resistance at a higher deposition rate and lower temperature.