(a) DC magnetron                (b) RF magnetron
  (c) Co-sputtering                (d) Substrate plasma
                                                        cleaning

Magnetron sputtering is widely used in today's production and R&D coating process for it's relative high performance and low running cost.

We are able to offer up to 1 meter linear magnetron sputtering source that suitable to deposit various materials(metal, metal oxide, metal nitride) for the mass production. Especially, thanks to the FCVA technology, our sputtering thin film has super excellent high performance when the magnetron sputtering source works with our patented FCVA source.

Sputterng thin film has a wide range of applicatons(No-conductive coating, Decorative Coating and etc), For example, it is very popular in the fashion decorative coating areas, the involvement of vacuum metallization changes the outlook of the plastic from pure painting to semi-transparent paint with metal reflective appearance. The color and effect is fascinating. In order to cater for the needs for such change, the company has created a series of coating system that able to tailor for such needs.