Arc-evaporation deposition is normally
used to apply wear-resistant coatings to
machine tools. However, the substantial
distribution of macroparticles associated
with this process limits the film quality.
To solve this problem, Nanofilm Technologies
International Pte Ltd has developed a revolutionary
new version of FCVA deposition technology.
Our patented technology can produce high
quality Tetrahedral Amorphous Carbon (ta-C)
coatings, as well as metal, oxides, and
other hard coatings to satisfy even the
most stringent requirements.
During deposition, a plasma beam with macroparticles
and neutral atoms is emitted from the cathodic
arc spot by a cathodic vacuum arc process.
Unwanted macroparticles and neutrals are
then be filtered out by a cross-magnetic
and electric field. Only ions within a well-defined
energy range are allowed to reach the substrate.
Harder, denser and cleaner films can be
produced by this technique which satisfy
the general requirement for all applications
- that the deposited films adhere well on
a substrate and have good optical, chemical,
electrical and mechanical properties that
are predictable and reproducible.