<%@ Page Language="C#" ContentType="text/html" ResponseEncoding="gb2312" %> Technology - FCVA
 
FCVA Technology
 

 
Year 2001 Innovation Award Singapore

Arc-evaporation deposition is normally used to apply wear-resistant coatings to machine tools. However, the substantial distribution of macroparticles associated with this process limits the film quality. To solve this problem, Nanofilm Technologies International Pte Ltd has developed a revolutionary new version of FCVA deposition technology. Our patented technology can produce high quality Tetrahedral Amorphous Carbon (ta-C) coatings, as well as metal, oxides, and other hard coatings to satisfy even the most stringent requirements.

During deposition, a plasma beam with macroparticles and neutral atoms is emitted from the cathodic arc spot by a cathodic vacuum arc process. Unwanted macroparticles and neutrals are then be filtered out by a cross-magnetic and electric field. Only ions within a well-defined energy range are allowed to reach the substrate. Harder, denser and cleaner films can be produced by this technique which satisfy the general requirement for all applications - that the deposited films adhere well on a substrate and have good optical, chemical, electrical and mechanical properties that are predictable and reproducible.





Schematic Diagram of the FCVA System  

Moreover, during deposition, the surface temperature of the substrate is generally below 70 °C, which makes coating on plastic possible too. Unlike conventional technologies (such as chemical vapor deposition and physical vapor deposition) FCVA produces coating species that are 100 % pure ions whose energy is tunable and well-defined. This technique can produce some unique films such as ta-C, MiCC, high-quality Al2O3 and Metal.


FCVA Thin Films:
     


5 major advantages of Nanofilm FCVA technology over similar technologies:

  • The FCVA technique produces coating species that are pure ions whose energy is well-defined and tunable for desired coating properties. Carbon and metal films produced by FCVA have more favorable film qualities than those produced using other technologies.

  • Our patented technology provides means for plasma scanning that results in excellent uniformity and repeatability. This has also solved the large area deposition issue which is still a major problem in other similar technologies.

  • For deposition of ta-C film, our patented technology produces far fewer macroparticles (~1 per cm2 compared to ~103 per cm2 produced by other similar technologies). The system produced by Nanofilm has been used successfully for hard disk slider overcoat and some tribological applications.

  • Our technology includes a complicated magnetic and electric field configuration in the anode area, making the cathode/anode scaleable and maintaining the output plasma in the form of a beam. This is important for large area high deposition rate applications.

  • FCVA also offers low temperature deposition and a high deposition rate, making it the ideal choice for a wide range of applications including coatings on plastics and rubbers.

 
Pictures of Competitor's Cathodic Arc Technology   Pictures of Nanofilm's Double Bend FCVA Technogloy
Film by Competitor's Cathodic Arc Technology
*Under optical microscope (X200)
  Film by Nanofilm's Double Bend FCVA Technology
*Under optical microscope (X200)
 
 
   
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